基于奧林巴斯protech2.5d軟件平臺的canon光刻機線寬優(yōu)化

1、 II ABSTRACT Traditional，we think the way of contact with the theory that a wide margin line to a size five micron, so we can do nothing but only through upgrading of equipment、 changing the exposure methods, to improve

2、 the exposure of the line width size. However, the great division of a device for investment, production and use the step into the form or in light of a projection, will significantly raise the cost of equipment and also

3、 bring the increase of production cost. Due to its design defects, and contact with the machine in the light from the end of the 1980s has been projected by the step machine and so on. This subject for us to replace the

4、Canon -501 contact with the light of the basic research in hardware, Olympus protech2.5d as software platforms. Try to pass the most traditional way of publicity, are met production needs of our current line width. Subje

5、ct in the light of the first time, readers against the light of a line on the effect of knowing things, and secondly, introduce the carrier for experimental Canon -501 light on the analysis, to sum up its exposure, as pa

6、rt of the environment, etc. Equipment for the entire experiment conditions, not as a focus is on. The whole experiment analysis and study in the line of improving by the methods. Detailed To influence the light of a line

7、 of seven major reasons,such as energy, light on a regular intervals, the quality, the exposure time, nitrogen with a comprehensive analysis, in theory the basis of analyzing, and to make a pivotal contrast, experiments,

8、 the experimental data by Olympus protech2.5d software platform for analysis and drawing from an analysis of the contrast, find the optimum solution at last. Keywords: Semiconductor，Optical lithography， Contact exposure，